High-mobility p-type NiOx thin-film transistors processed at low temperatures with Al2O3 high-k dielectric. Issue 40 (20th September 2016)
- Record Type:
- Journal Article
- Title:
- High-mobility p-type NiOx thin-film transistors processed at low temperatures with Al2O3 high-k dielectric. Issue 40 (20th September 2016)
- Main Title:
- High-mobility p-type NiOx thin-film transistors processed at low temperatures with Al2O3 high-k dielectric
- Authors:
- Shan, Fukai
Liu, Ao
Zhu, Huihui
Kong, Weijin
Liu, Jingquan
Shin, Byoungchul
Fortunato, Elvira
Martins, Rodrigo
Liu, Guoxia - Abstract:
- Abstract : High-performance p-type NiO x thin-film transistors are fabricated via a low-cost solution process and exhibit a high mobility of around 15 cm 2 V −1 s −1 . Abstract : Although there are a few research studies on solution-processed p-channel oxide thin-film transistors (TFTs), the strict fabrication conditions and the poor electrical properties have limited their applications in low-power complementary metal oxide semiconductor (CMOS) electronics. Here, the application of the polyol reduction method for processing p-type Cu x O and NiO x channel layers and their implementation in TFT devices are reported. The optimized Cu x O and NiO x TFTs were achieved at low annealing temperatures (∼300 °C) and exhibited decent electrical properties. Encouraged by the inspiring results obtained on SiO2 /Si substrates, the TFT performance was further optimized by device engineering, employing high- k AlO x as the gate dielectric. The fully solution-processed NiO x /AlO x TFT could be operated at a low voltage of 3.5 V and exhibits a high hole mobility of around 25 cm 2 V −1 s −1 . Our work demonstrates the ability to grow high-quality p-type oxide films and devices via the polyol reduction method over large area substrates while at the same time it provides guidelines for further p-type oxide material and device improvements.
- Is Part Of:
- Journal of materials chemistry. Volume 4:Issue 40(2016)
- Journal:
- Journal of materials chemistry
- Issue:
- Volume 4:Issue 40(2016)
- Issue Display:
- Volume 4, Issue 40 (2016)
- Year:
- 2016
- Volume:
- 4
- Issue:
- 40
- Issue Sort Value:
- 2016-0004-0040-0000
- Page Start:
- 9438
- Page End:
- 9444
- Publication Date:
- 2016-09-20
- Subjects:
- Materials -- Periodicals
Chemistry, Analytic -- Periodicals
Optical materials -- Research -- Periodicals
Electronics -- Materials -- Research -- Periodicals
543.0284 - Journal URLs:
- http://pubs.rsc.org/en/journals/journalissues/tc# ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/c6tc02137a ↗
- Languages:
- English
- ISSNs:
- 2050-7526
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5012.205300
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 799.xml