Cite
HARVARD Citation
Zhang, L. et al. (2016). Thermal stability of Mg2Si0.4Sn0.6 in inert gases and atomic-layer-deposited Al2O3 thin film as a protective coating. Journal of materials chemistry. 4 (45), pp. 17726-17731. [Online].
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Zhang, L. et al. (2016). Thermal stability of Mg2Si0.4Sn0.6 in inert gases and atomic-layer-deposited Al2O3 thin film as a protective coating. Journal of materials chemistry. 4 (45), pp. 17726-17731. [Online].