A photocurable leaky dielectric for highly electrical insulating electrohydrodynamic micro-/nanopatterns. Issue 43 (20th September 2016)

• Record Type: Journal Article
• Authors: Wang, Guolong; Lv, Guowei; Zhang, Shihu; Shao, Jinyou; Li, Xiangming; Tian, Hongmiao; Yu, Demei; Zhang, Lifeng
• Is Part Of: Soft matter. Volume 12:Issue 43(2016)
• Page Start: 8819
• Page End: 8824
• Publication Date: 2016-09-20
• Subjects: Soft condensed matter -- Periodicals; 530.413
• DOI: 10.1039/c6sm01151a
• Languages: English
• ISSNs: 1744-683X

Abstract

Abstract : An innovative photocurable leaky dielectric material is developed for high-performance electrohydrodynamic patterning towards highly electrical insulating micro-/nanopatterns. Abstract : This communication describes an innovative photocurable leaky dielectric for electrohydrodynamic patterning (EHDP). Based on the well-designed molecular structure, the material in its liquid state exhibits low viscosity, high homogeneity, and more importantly a leaky dielectric characteristic; meanwhile, UV light irradiation transforms it from a liquid leaky dielectric into a solid perfect dielectric instantaneously via an interfacial reaction. Two typical EHDP processes have confirmed that the beneficial properties of this material help to rapidly fulfill a higher aspect ratio and/or smaller feature size patterning compared to its perfect dielectric counterpart. Therefore, this material provides the potential in accessing high-performance EHDP towards fabricating electrically insulating micro-/nanostructures.