Van der Waals Force Isolation of Monolayer MoS2. Issue 45 (30th September 2016)
- Record Type:
- Journal Article
- Title:
- Van der Waals Force Isolation of Monolayer MoS2. Issue 45 (30th September 2016)
- Main Title:
- Van der Waals Force Isolation of Monolayer MoS2
- Authors:
- Gurarslan, Alper
Jiao, Shuping
Li, Tai‐De
Li, Guoqing
Yu, Yiling
Gao, Yang
Riedo, Elisa
Xu, Zhiping
Cao, Linyou - Abstract:
- Abstract : Monolayer MoS2 can effectively screen the vdW interaction of underlying substrates with external systems by >90% because of the substantial increase in the separation between the substrate and external systems due to the presence of the monolayer. This substantial screening of vdW interactions by MoS2 monolayer is different from what reported at graphene.
- Is Part Of:
- Advanced materials. Volume 28:Issue 45(2016)
- Journal:
- Advanced materials
- Issue:
- Volume 28:Issue 45(2016)
- Issue Display:
- Volume 28, Issue 45 (2016)
- Year:
- 2016
- Volume:
- 28
- Issue:
- 45
- Issue Sort Value:
- 2016-0028-0045-0000
- Page Start:
- 10055
- Page End:
- 10060
- Publication Date:
- 2016-09-30
- Subjects:
- Materials -- Periodicals
Chemical vapor deposition -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1521-4095 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adma.201601581 ↗
- Languages:
- English
- ISSNs:
- 0935-9648
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.897800
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 2610.xml