Angle‐Insensitive and CMOS‐Compatible Subwavelength Color Printing. Issue 11 (11th August 2016)

• Record Type: Journal Article
• Authors: Lee, Kyu‐Tae; Jang, Ji‐Yun; Park, Sang Jin; Ji, Chengang; Yang, Sung‐Mo; Guo, L. Jay; Park, Hui Joon
• Is Part Of: Advanced optical materials. Volume 4:Issue 11(2016:Nov.)
• Page Start: 1696
• Page End: 1702
• Publication Date: 2016-08-11
• Subjects: angle‐insensitivity -- color filters -- nanocavities -- nanoimprint lithography -- nanostructures; Optical materials -- Periodicals; Photonics -- Periodicals; 620.11295
• DOI: 10.1002/adom.201600287
• Languages: English
• ISSNs: 2195-1071

Abstract

Abstract : Photonic nanostructures for a wide‐angle and complementary metal‐oxide semiconductor‐compatible structural color printing scheme exploiting strong resonance effects in ultrathin subwavelength semiconductor gratings are demonstrated. The proposed structures create distinctive colors with great homogeneity and high color saturation, easily tuned by varying a width of the subwavelength gratings, thereby enabling individual color pixels to be patterned via one‐step process.