Influence of substrate nature on the growth of copper oxide thin films. (11th May 2016)

• Record Type: Journal Article
• Authors: Bhattacharyya, A. S.; Raj, S. K.; Kommu, Parameshwar; Prabhakar, P.; Kumar, R. Praveen; Kumari, Neha; Gaurav, Kumar
• Is Part Of: Surface and interface analysis. Volume 48:Number 12(2016)
• Page Start: 1294
• Page End: 1298
• Publication Date: 2016-05-11
• Subjects: Cu thin films -- sputtering -- copper oxide -- substrates; Surfaces (Physics) -- Periodicals; Surface chemistry -- Periodicals; Thin films -- Periodicals; 541.33
• DOI: 10.1002/sia.6035
• Languages: English
• ISSNs: 0142-2421

Abstract

Abstract : Cu thin films were deposited on Si(111), glass, and quartz substrates by magnetron sputtering. X‐ray diffraction, SEM, and photoemission electron microscope studies were carried out to characterize the films. An influence of the nature of substrate on the Cu2 O and CuO phases formed was observed. Copper silicide formation in case of silicon substrates aided in formation of Cu2 O rather than CuO unlike glass and quartz substrates. Formation of nanocrystallites was observed by SEM and X‐ray diffraction. Copyright © 2016 John Wiley & Sons, Ltd.