Reversible phase transition in vanadium oxide films sputtered on metal substrates. (1st November 2016)

• Record Type: Journal Article
• Authors: Palai, Debajyoti; Carmel Mary Esther, A.; Porwal, Deeksha; Pradeepkumar, Maurya Sandeep; Raghavendra Kumar, D.; Bera, Parthasarathi; Sridhara, N.; Dey, Arjun
• Is Part Of: Philosophical magazine letters. Volume 96:Number 11(2016)
• Page Start: 440
• Page End: 446
• Publication Date: 2016-11-01
• Subjects: Vanadium oxide -- thin films -- reversible-phase transition -- XRD -- XPS -- thermo-optical properties -- DSC; Condensed matter -- Periodicals; Physics -- Periodicals; Solid state physics -- Periodicals; Physique -- Périodiques; 530.41
• DOI: 10.1080/09500839.2016.1247993
• Languages: English
• ISSNs: 0950-0839

Abstract

Abstract: Vanadium oxide films, deposited on aluminium (Al), titanium (Ti) and tantalum (Ta) metal substrates by pulsed RF magnetron sputtering at a working pressure of 1.5 x10 −2 mbar at room temperature are found to display mixed crystalline vanadium oxide phases viz., VO2, V2 O3, V2 O5 . The films have been characterized by field-emission scanning electron microscopy, X-ray diffraction, differential scanning calorimetry (DSC) and X-ray photoelectron spectroscopy, and their thermo-optical and electrical properties have been investigated. Studies of the deposited films by DSC have revealed a reversible-phase transition found in the temperature range of 45–49 °C.