Age hardening in (Ti1 − xAlx)B2 + Δ thin films. (15th January 2017)

• Record Type: Journal Article
• Authors: Mockute, A.; Palisaitis, J.; Alling, B.; Berastegui, P.; Broitman, E.; Näslund, L.-Å.; Nedfors, N.; Lu, J.; Jensen, J.; Hultman, L.; Patscheider, J.; Jansson, U.; Persson, P.O.Å.; Rosen, J.
• Is Part Of: Scripta materialia. Volume 127(2017)
• Page Start: 122
• Page End: 126
• Publication Date: 2017-01-15
• Subjects: Titanium diboride -- Thin films -- Mechanical properties -- Hardness; Materials -- Periodicals; Metallurgy -- Periodicals; Metalen; Legeringen; Materiaalkunde; Metals, metalworking and machinery industries; Metals; Electronic journals; 620.11
• DOI: 10.1016/j.scriptamat.2016.09.021
• Languages: English
• ISSNs: 1359-6462

Abstract

Abstract: Thin films of (Ti0.71 Al0.29 )B2 + 1.08 have been deposited by magnetron sputtering. Post-deposition annealing at 1000 °C for 1 h results in increased hardness and elastic modulus, from 32 to 37 GPa and from 436 to 461 GPa, respectively. In both as-deposited and annealed states the films adhere well to the substrate, indicating no considerable internal stress. The initial high hardness is attributed to a columnar microstructure consisting of crystalline (Ti, Al)B2 columns separated by an amorphous B matrix. The observed age hardening corresponds to phase separation within the (Ti, Al)B2 columns including the formation of Ti-deficient crystallites within the grain interior upon annealing. Graphical abstract: