Cite
HARVARD Citation
Vital, A. et al. (2015). Submicronic etched features of silicon with high aspect ratio obtained by cryogenic plasma deep-etching through perforated polymer thin films. MRS proceedings. p. . [Online].
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Vital, A. et al. (2015). Submicronic etched features of silicon with high aspect ratio obtained by cryogenic plasma deep-etching through perforated polymer thin films. MRS proceedings. p. . [Online].