Making germanium, an indirect band gap semiconductor, suitable for light-emitting devices *Invited talk at the 7th International Workshop on Advanced Materials Science and Nanotechnology IWAMSN2014, 2-6 November, 2014, Ha Long, Vietnam. (6th January 2015)
- Record Type:
- Journal Article
- Title:
- Making germanium, an indirect band gap semiconductor, suitable for light-emitting devices *Invited talk at the 7th International Workshop on Advanced Materials Science and Nanotechnology IWAMSN2014, 2-6 November, 2014, Ha Long, Vietnam. (6th January 2015)
- Main Title:
- Making germanium, an indirect band gap semiconductor, suitable for light-emitting devices *Invited talk at the 7th International Workshop on Advanced Materials Science and Nanotechnology IWAMSN2014, 2-6 November, 2014, Ha Long, Vietnam.
- Authors:
- Luong, Thi Kim Phuong
Thanh, Vinh Le
Ghrib, Abdelhamid
Kurdi, Moustafa El
Boucaud, Philippe - Abstract:
- Abstract: Germanium (Ge) is a group-IV indirect band gap semiconductor but the difference between its direct and indirect band gap is only 140 meV. It has been shown that when Ge is subjected to a tensile strain and a heavy n -doping level, room-temperature photoluminescence (PL) can be greatly enhanced. Among these two factors, achieving a heavy n -doping level in Ge (i.e., electron concentrations higher than 1 × 10 19 cm −3 ) is a challenge since the solubility of most group-V elements (P, As, Sb) in Ge is very low. We report here Ge growth on silicon substrates using molecular beam epitaxial (MBE) technique. To enhance the n -doping level in Ge, a specific n -doping process based on the decomposition of the GaP compound has been implemented. The GaP decomposition allows producing P2 molecules, which have a higher sticking coefficient than that of P4 molecules. We show that phosphorus doping at low substrate temperatures followed by flash thermal annealing are essential to get a high doping level. We have obtained an activate phosphorus concentration up to 2 × 10 19 cm −3 and room-temperature PL measurements reveal an intensity enhancement up to 50 times. This result opens a new route for the realization of group-IV semiconductor optoelectronic devices.
- Is Part Of:
- Advances in natural sciences. Volume 6:Number 1(2015)
- Journal:
- Advances in natural sciences
- Issue:
- Volume 6:Number 1(2015)
- Issue Display:
- Volume 6, Issue 1 (2015)
- Year:
- 2015
- Volume:
- 6
- Issue:
- 1
- Issue Sort Value:
- 2015-0006-0001-0000
- Page Start:
- Page End:
- Publication Date:
- 2015-01-06
- Subjects:
- tensile strain -- heavy n-doping -- Ge band gap engineering -- GaP decomposition -- group-IV semiconductor
4.10 -- 5.03 -- 5.04
Nanotechnology -- Periodicals
Nanoscience -- Periodicals
620.5 - Journal URLs:
- http://iopscience.iop.org/2043-6262 ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/2043-6262/6/1/015013 ↗
- Languages:
- English
- ISSNs:
- 2043-6254
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
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