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HARVARD Citation
Kim, K. et al. (2016). Ferroelectricity in undoped-HfO2 thin films induced by deposition temperature control during atomic layer deposition. Journal of materials chemistry. 4 (28), pp. 6864-6872. [Online].
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Kim, K. et al. (2016). Ferroelectricity in undoped-HfO2 thin films induced by deposition temperature control during atomic layer deposition. Journal of materials chemistry. 4 (28), pp. 6864-6872. [Online].