Optimizing the process efficiency of atomic layer deposition of alumina for its sustainability improvement: a combined experimental and modeling study. (1st October 2016)
- Record Type:
- Journal Article
- Title:
- Optimizing the process efficiency of atomic layer deposition of alumina for its sustainability improvement: a combined experimental and modeling study. (1st October 2016)
- Main Title:
- Optimizing the process efficiency of atomic layer deposition of alumina for its sustainability improvement: a combined experimental and modeling study
- Authors:
- Xie, Yuanyuan
Pan, Dongqing
Ma, Lulu
Yuan, Chris - Abstract:
- Abstract: Atomic Layer Deposition (ALD) technology has been under rapid development toward a broad array of applications, while the low deposition efficiency and heavy waste of TMA are limiting its industrial-scale applications. In this paper, a mathematical model is developed based on an experimental ALD of alumina process, and an optimization approach is then proposed to investigate the optimal ALD operating for the minimum TMA wastes and the maximum Al2 O3 production under various conditions. Results show that the maximum TMA adsorption and alumina production cannot be achieved simultaneously, but sufficient H2 O dosing can minimize the gap between them. The influence of substrate surface saturation condition and operating temperature is also investigated. Results quantitatively show that lower surface saturation condition requires more ALD cycles to improve the precursors' utilization efficiency, while the optimal ALD process can increase the maximum alumina production from2.7 × 10 −4 mol/m 2 to 7.5 × 10 −4 mol/m 2 with the temperature rise from 150 °C to 200 °C. Besides, it is found that the maximum production of both |-Al(CH3 )2 and alumina is influenced by their corresponding half-cycle duration, and sufficient treatment time can significantly improve the ALD process efficiency and reduce the total TMA waste. These insights into the minimum TMA waste and maximum production of surface products can guide the future design of ALD of alumina process with betterAbstract: Atomic Layer Deposition (ALD) technology has been under rapid development toward a broad array of applications, while the low deposition efficiency and heavy waste of TMA are limiting its industrial-scale applications. In this paper, a mathematical model is developed based on an experimental ALD of alumina process, and an optimization approach is then proposed to investigate the optimal ALD operating for the minimum TMA wastes and the maximum Al2 O3 production under various conditions. Results show that the maximum TMA adsorption and alumina production cannot be achieved simultaneously, but sufficient H2 O dosing can minimize the gap between them. The influence of substrate surface saturation condition and operating temperature is also investigated. Results quantitatively show that lower surface saturation condition requires more ALD cycles to improve the precursors' utilization efficiency, while the optimal ALD process can increase the maximum alumina production from2.7 × 10 −4 mol/m 2 to 7.5 × 10 −4 mol/m 2 with the temperature rise from 150 °C to 200 °C. Besides, it is found that the maximum production of both |-Al(CH3 )2 and alumina is influenced by their corresponding half-cycle duration, and sufficient treatment time can significantly improve the ALD process efficiency and reduce the total TMA waste. These insights into the minimum TMA waste and maximum production of surface products can guide the future design of ALD of alumina process with better efficiency and sustainability. Highlights: A combined experimental and modeling work is conducted on the ALD of alumina process. The detailed surface chemistry is considered, and is validated by the experimental results. An optimization approach is developed to explore the optimal ALD of alumina process. The effect of different ALD operating parameters are investigated by both modeling and experiment. … (more)
- Is Part Of:
- Journal of cleaner production. Volume 133(2016:Oct.)
- Journal:
- Journal of cleaner production
- Issue:
- Volume 133(2016:Oct.)
- Issue Display:
- Volume 133 (2016)
- Year:
- 2016
- Volume:
- 133
- Issue Sort Value:
- 2016-0133-0000-0000
- Page Start:
- 338
- Page End:
- 347
- Publication Date:
- 2016-10-01
- Subjects:
- Atomic layer deposition -- Optimization -- Alumina film -- Process efficiency
Factory and trade waste -- Management -- Periodicals
Manufactures -- Environmental aspects -- Periodicals
Déchets industriels -- Gestion -- Périodiques
Usines -- Aspect de l'environnement -- Périodiques
628.5 - Journal URLs:
- http://www.sciencedirect.com/science/journal/09596526 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.jclepro.2016.05.138 ↗
- Languages:
- English
- ISSNs:
- 0959-6526
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 4958.369720
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 518.xml