Cite
HARVARD Citation
Zigelman, A. et al. (2016). A model for pattern deposition from an evaporating solution subject to contact angle hysteresis and finite solubility. Soft matter. 12 (26), pp. 5693-5707. [Online].
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Zigelman, A. et al. (2016). A model for pattern deposition from an evaporating solution subject to contact angle hysteresis and finite solubility. Soft matter. 12 (26), pp. 5693-5707. [Online].