Cite
HARVARD Citation
Lebedev, M. et al. (n.d.). Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation. Materials science in semiconductor processing. pp. 81-88. [Online].
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Lebedev, M. et al. (n.d.). Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation. Materials science in semiconductor processing. pp. 81-88. [Online].