Parallel Band and Hopping Electron Transport in SrTiO3. (18th February 2016)
- Record Type:
- Journal Article
- Title:
- Parallel Band and Hopping Electron Transport in SrTiO3. (18th February 2016)
- Main Title:
- Parallel Band and Hopping Electron Transport in SrTiO3
- Authors:
- Saraf, Shimon
Riess, Ilan
Rothschild, Avner - Abstract:
- Abstract : SrTiO3 (STO) is a model system for studying oxide electronic devices. This work examines the electronic transport through a heterostructure comprising an acceptor (Fe)‐doped STO layer on a donor (Nb)‐doped STO substrate. This is done by fitting the steady‐state current–voltage ( I – V ) curve measured at ambient temperature to numerical solutions of the drift‐diffusion equations of itinerant (i.e., free) electrons and holes (band conduction) and localized electrons hopping through defect states within the bandgap (hopping conduction). The analysis shows that at reverse bias and small forward bias the current is carried mostly by hopping electrons that give rise to unexpectedly high currents. At forward bias above 1 V, most of the current is due to electron transport through the conduction band. The transition from hopping to band conduction occurs when the quasi Fermi levels of electrons and holes depart from the energy level of the defect states through which the electrons hop. These observations shed new light on the transport properties of STO‐based devices at ambient temperatures wherein ionic defects such as oxygen vacancies are immobile and holes are trapped, for the most part. Abstract : The steady‐state electronic transport through Fe‐doped SrTiO3 epilayer sandwiched between Nb‐doped SrTiO3 substrate and Pt electrode is investigated. At reverse and small forward bias, the current is mainly due to electron hopping through localized defect states within theAbstract : SrTiO3 (STO) is a model system for studying oxide electronic devices. This work examines the electronic transport through a heterostructure comprising an acceptor (Fe)‐doped STO layer on a donor (Nb)‐doped STO substrate. This is done by fitting the steady‐state current–voltage ( I – V ) curve measured at ambient temperature to numerical solutions of the drift‐diffusion equations of itinerant (i.e., free) electrons and holes (band conduction) and localized electrons hopping through defect states within the bandgap (hopping conduction). The analysis shows that at reverse bias and small forward bias the current is carried mostly by hopping electrons that give rise to unexpectedly high currents. At forward bias above 1 V, most of the current is due to electron transport through the conduction band. The transition from hopping to band conduction occurs when the quasi Fermi levels of electrons and holes depart from the energy level of the defect states through which the electrons hop. These observations shed new light on the transport properties of STO‐based devices at ambient temperatures wherein ionic defects such as oxygen vacancies are immobile and holes are trapped, for the most part. Abstract : The steady‐state electronic transport through Fe‐doped SrTiO3 epilayer sandwiched between Nb‐doped SrTiO3 substrate and Pt electrode is investigated. At reverse and small forward bias, the current is mainly due to electron hopping through localized defect states within the bandgap. At forward bias above ≈1 V most of the current is due to electron transport through the conduction band. … (more)
- Is Part Of:
- Advanced Electronic Materials. Volume 2:Number 5(2016)
- Journal:
- Advanced Electronic Materials
- Issue:
- Volume 2:Number 5(2016)
- Issue Display:
- Volume 2, Issue 5 (2016)
- Year:
- 2016
- Volume:
- 2
- Issue:
- 5
- Issue Sort Value:
- 2016-0002-0005-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2016-02-18
- Subjects:
- defect chemistry -- electron hopping -- electron transport -- memristors -- SrTiO3
Materials -- Electric properties -- Periodicals
Materials science -- Periodicals
Magnetic materials -- Periodicals
Electronic apparatus and appliances -- Periodicals
537 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)2199-160X ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/aelm.201500368 ↗
- Languages:
- English
- ISSNs:
- 2199-160X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.848400
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 1978.xml