Influence of the interface width on the adhesion strength of copper films deposited on negatively biased carbon steel substrates. Issue 2 (17th January 2016)
- Record Type:
- Journal Article
- Title:
- Influence of the interface width on the adhesion strength of copper films deposited on negatively biased carbon steel substrates. Issue 2 (17th January 2016)
- Main Title:
- Influence of the interface width on the adhesion strength of copper films deposited on negatively biased carbon steel substrates
- Authors:
- Ouis, Abousoufiane
- Abstract:
- Abstract: In order to improve the adhesion of copper films deposited by DC magnetron sputtering on carbon steel substrates, a negative bias voltage was applied to the substrate during the film deposition process. The scratch test was used to evaluate the adhesion strength of the films on the substrates. Chemical element identification and interface width measurement were carried out by Auger electron spectroscopy. The experimental results show that a variation of the bias voltage causes a change in the behaviour of the interface width similar to that of the critical load. The size of the interface width is obtained from Auger elemental depth profiles by measuring the depth of the interface between the coating and the substrate. It had a value of 45 min for an unbiased substrate and increased to 310 min at a bias of 450 V. In the latter case, the interface is relatively wide and the effects of diffusion and physical mixing of materials at the interface become preponderant. Then, the interface width decreased to 130 min at 600 V in which case it gets narrower and the phenomenon of film densification becomes prominent. In all cases, the substrate temperature generated by the bias voltage also has an effect. Moreover, it was observed in this study that the critical load increases with the size of the interface width. As a result, the application of a bias voltage contributes positively to the enlargement of the interface and consequently enhances the adhesion strength.
- Is Part Of:
- Journal of adhesion science and technology. Volume 30:Issue 2(2016)
- Journal:
- Journal of adhesion science and technology
- Issue:
- Volume 30:Issue 2(2016)
- Issue Display:
- Volume 30, Issue 2 (2016)
- Year:
- 2016
- Volume:
- 30
- Issue:
- 2
- Issue Sort Value:
- 2016-0030-0002-0000
- Page Start:
- 145
- Page End:
- 156
- Publication Date:
- 2016-01-17
- Subjects:
- DC magnetron sputtering -- bias voltage -- adhesion -- scratch test -- Auger electron spectroscopy
Adhesion -- Periodicals
Adhesives -- Periodicals
668.3 - Journal URLs:
- http://www.tandfonline.com/toc/tast20/current ↗
http://www.tandfonline.com/ ↗ - DOI:
- 10.1080/01694243.2015.1092747 ↗
- Languages:
- English
- ISSNs:
- 0169-4243
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 4918.936000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 1009.xml