Origin of the first-phase selection during thin film reactive diffusion: Experimental and theoretical insights into the Pd-Ge system. (September 2016)

• Record Type: Journal Article
• Authors: Perrin Toinin, J.; Hoummada, K.; Bertoglio, M.; Portavoce, A.
• Is Part Of: Scripta materialia. Volume 122(2016)
• Page Start: 22
• Page End: 25
• Publication Date: 2016-09
• Subjects: Thin film -- Reaction -- Germanide -- Kinetic Monte Carlo -- Self-diffusion; Materials -- Periodicals; Metallurgy -- Periodicals; Metalen; Legeringen; Materiaalkunde; Metals, metalworking and machinery industries; Metals; Electronic journals; 620.11
• DOI: 10.1016/j.scriptamat.2016.05.008
• Languages: English
• ISSNs: 1359-6462

Abstract

Abstract: Pd-Ge reactive-diffusion in two different samples Pd/Ge(001) and Pd/PdGe/Ge(001) was studied experimentally and theoretically, in order to clearly identify the driving force controlling the first-phase selection in the sequential phase formation regime. The experimental and theoretical results both show that only the atomic transport kinetic in the phases controls the first-phase selection: the phase exhibiting the fastest atomic self-diffusion forms first, even if its formation energy is not the lowest. Graphical abstract: