Low energy ion scattering (LEIS). A practical introduction to its theory, instrumentation, and applications. Issue 17 (19th April 2016)

• Record Type: Journal Article
• Authors: Cushman, Cody V.; Brüner, Philipp; Zakel, Julia; Major, George H.; Lunt, Barry M.; Smith, Nicholas J.; Grehl, Thomas; Linford, Matthew R.
• Is Part Of: Analytical methods. Volume 8:Issue 17(2016)
• Page Start: 3419
• Page End: 3439
• Publication Date: 2016-04-19
• Subjects: Chemistry, Analytic -- Periodicals; Analytical biochemistry -- Periodicals; Chemical laboratories -- Standards -- Periodicals; 543.1905
• DOI: 10.1039/c6ay00765a
• Languages: English
• ISSNs: 1759-9660

Abstract

Abstract : Noble gas ion scattering off of a ZrO2 film on Si (left), and mock LEIS spectrum for this material (right). Abstract : Low energy ion scattering (LEIS) probes the elemental composition of the outermost atomic layer of a material and provides static depth profiles of the outer ca. 10 nm of surfaces. Its extreme surface sensitivity and quantitative nature make it a powerful tool for studying the relationships between surface chemistry and surface related phenomena such as wetting, adhesion, contamination, and thin film growth. The high depth resolution obtained in LEIS in its static and sputter depth profile modes are useful for studying the layer structures of thin films. LEIS instrumentation has improved significantly in recent years, showing dramatic increases in its sensitivity and further expanding its potential applications. In this article, we provide a practical introduction to the technique, including a discussion of the basic theory of LEIS, LEIS spectra, LEIS instrumentation, and LEIS applications, including catalysts, solid oxide fuel cells (SOFCs), and thin films in integrated circuits.