Cite
HARVARD Citation
Gebhard, M. et al. (2016). An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor. Journal of materials chemistry. 4 (5), pp. 1057-1065. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Gebhard, M. et al. (2016). An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor. Journal of materials chemistry. 4 (5), pp. 1057-1065. [Online].