Degradation and nano-patterning of ferroelectric P(VDF-TrFE) thin films with electron irradiation. Issue 129 (16th December 2015)

• Record Type: Journal Article
• Authors: Zhu, Ren; Jenkins, Kory; Yang, Rusen
• Is Part Of: RSC advances. Volume 5:Issue 129(2015)
• Page Start: 106700
• Page End: 106705
• Publication Date: 2015-12-16
• Subjects: Chemistry -- Periodicals; 540.5
• DOI: 10.1039/c5ra19485g
• Languages: English
• ISSNs: 2046-2069

Abstract

Abstract : Low energy electrons were found to degrade the ferroelectricity of P(VDF-TrFE) and a new grayscale lithography was hence proposed. Abstract : P(VDF-TrFE) nanofilm is a critical component in many organic electronics. Here we report the irreversible degradation of its ferroelectricity due to medium-energy electron irradiation (<10 keV), which is commonly found in device fabrication and characterization tools. The first-order electromechanical coupling in P(VDF-TrFE) was directly measured by atomic force microscopy to study the ferroelectricity switching property. Results showed that P(VDF-TrFE) films became non-ferroelectric after metal deposition in an electron-beam evaporator or after two minutes of observation under a scanning electron microscope. Lowering the electron energy slowed down the degradation process, but 500 eV electrons were still detrimental to the film. Irradiation is believed to transform the all-trans polar phase of P(VDF-TrFE) into a non-polar state, as revealed by infrared spectroscopy. On the other hand, controlled electron irradiation allows us to create patterns on the ferroelectric P(VDF-TrFE) thin films at submicron spatial resolution.