Cite
HARVARD Citation
Zhang, J. et al. (2015). Metal-carbonyl organometallic polymers, PFpP, as resists for high-resolution positive and negative electron beam lithography. Chemical communications. 51 (99), pp. 17592-17595. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Zhang, J. et al. (2015). Metal-carbonyl organometallic polymers, PFpP, as resists for high-resolution positive and negative electron beam lithography. Chemical communications. 51 (99), pp. 17592-17595. [Online].