Highly Porous ZnO Thin Films and 1D Nanostructures by Remote Plasma Processing of Zn‐Phthalocyanine. Issue 2 (2nd November 2015)
- Record Type:
- Journal Article
- Title:
- Highly Porous ZnO Thin Films and 1D Nanostructures by Remote Plasma Processing of Zn‐Phthalocyanine. Issue 2 (2nd November 2015)
- Main Title:
- Highly Porous ZnO Thin Films and 1D Nanostructures by Remote Plasma Processing of Zn‐Phthalocyanine
- Authors:
- Alcaire, Maria
Filippin, Alejandro Nicolas
Macias‐Montero, Manuel
Sanchez‐Valencia, Juan R.
Rojas, Teresa Cristina
Mora‐Boza, Ana
Lopez‐Santos, Carmen
Espinos, Juan P.
Barranco, Angel
Borras, Ana - Abstract:
- Abstract : In this paper the fabrication of highly porous 1D nanostructures by a vacuum and plasma etching combined protocol is presented. Zn‐phthalocyanine (ZnPc) is utilized as a solid precursor to form the ZnO. First the ZnPc is sublimated in low argon pressure. Depending on the substrate temperature and microstructure, polycrystalline films or single crystal ZnPc nanowires are grown. These starting materials are then subjected to a remote plasma oxidizing treatment. Experimental parameters such as substrate position, plasma power, treatment duration, and substrate temperature determine the microstructure and properties of the final ZnO nanostructures. The article gathers an in depth study of the obtained porous nanostructured films following scanning and transmission electron microscopy (SEM and TEM), X‐ray photoelectron spectroscopy (XPS), X‐ray Diffraction (XRD), UV‐Vis transmittance, and fluorescence spectroscopies. Abstract : A vacuum protocol is presented for the fabrication of highly porous 2D and 1D nanostructures based on the plasma oxidation of Zn‐phthalocyanine precursor layers previously formed by physical vapor deposition. Luminescent antireflective coatings of ZnO are achieved. The method developed is straightforwardly extendable to the fabrication of other metal oxide and metal porous materials thanks to the ample variety in the metal phthalocyanine precursors.
- Is Part Of:
- Plasma processes and polymers. Volume 13:Issue 2 (2016)
- Journal:
- Plasma processes and polymers
- Issue:
- Volume 13:Issue 2 (2016)
- Issue Display:
- Volume 13, Issue 2 (2016)
- Year:
- 2016
- Volume:
- 13
- Issue:
- 2
- Issue Sort Value:
- 2016-0013-0002-0000
- Page Start:
- 287
- Page End:
- 297
- Publication Date:
- 2015-11-02
- Subjects:
- nanowires -- phthalocyanine -- plasma etching -- porous films -- ZnO
Plasma polymerization -- Periodicals
Plasma-enhanced chemical vapor deposition -- Periodicals
Plasma chemistry -- Periodicals - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1612-8869 ↗
http://www3.interscience.wiley.com/cgi-bin/jtoc/106571203 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/ppap.201500133 ↗
- Languages:
- English
- ISSNs:
- 1612-8850
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 6528.781000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 2740.xml