Wafer-scale synthesis of defined polymer brushes under ambient conditions. Issue 47 (9th October 2015)
- Record Type:
- Journal Article
- Title:
- Wafer-scale synthesis of defined polymer brushes under ambient conditions. Issue 47 (9th October 2015)
- Main Title:
- Wafer-scale synthesis of defined polymer brushes under ambient conditions
- Authors:
- Zhang, Tao
Du, Yunhao
Kalbacova, Jana
Schubel, René
Rodriguez, Raul D.
Chen, Tao
Zahn, Dietrich R. T.
Jordan, Rainer - Abstract:
- Abstract : A facile method to synthesize dense, homo- and multiblock copolymer brushes on the wafer-scale under ambient conditions is presented. Abstract : A method is presented that allows for the first time the preparation of highly defined polymer brush coatings on the wafer-scale under ambient conditions (room temperature, exposure to air) from a broad variety of monomers. The discovered high oxygen-tolerance of the surface-initiated Cu(0)-mediated controlled radical polymerization (SI-CuCRP) yields entire wafers homogeneously covered by a polymer brush of linear, high molar mass polymers with narrow dispersities ( Đ = 1.1) at extremely high grafting densities (≈1 chain per nm 2 ). The low-tech and air tolerant method requires only ≲4 mL reaction solution containing a monomer and a ligand between two facing substrates. Thus, the SI-CuCRP is scalable to any surface area with minimal costs and minimal equipment. Despite the simplicity of the method, the high endgroup fidelity of SI-CuCRP is demonstrated by the preparation of a tetrablock copolymer brush which is the first example of a higher order block copolymer brush prepared by any surface-initiated polymerization. Finally, we present a new facile lithographic technique, the copper plate proximity printing (CP 3 ), which relies on the proximity of the bulk copper surface to the initiator-bearing substrate. The CP 3 is resist- and development-free and transfers the copper plate profile (of a copper coin) directly into anAbstract : A facile method to synthesize dense, homo- and multiblock copolymer brushes on the wafer-scale under ambient conditions is presented. Abstract : A method is presented that allows for the first time the preparation of highly defined polymer brush coatings on the wafer-scale under ambient conditions (room temperature, exposure to air) from a broad variety of monomers. The discovered high oxygen-tolerance of the surface-initiated Cu(0)-mediated controlled radical polymerization (SI-CuCRP) yields entire wafers homogeneously covered by a polymer brush of linear, high molar mass polymers with narrow dispersities ( Đ = 1.1) at extremely high grafting densities (≈1 chain per nm 2 ). The low-tech and air tolerant method requires only ≲4 mL reaction solution containing a monomer and a ligand between two facing substrates. Thus, the SI-CuCRP is scalable to any surface area with minimal costs and minimal equipment. Despite the simplicity of the method, the high endgroup fidelity of SI-CuCRP is demonstrated by the preparation of a tetrablock copolymer brush which is the first example of a higher order block copolymer brush prepared by any surface-initiated polymerization. Finally, we present a new facile lithographic technique, the copper plate proximity printing (CP 3 ), which relies on the proximity of the bulk copper surface to the initiator-bearing substrate. The CP 3 is resist- and development-free and transfers the copper plate profile (of a copper coin) directly into an image composed of a 3D polymer brush. … (more)
- Is Part Of:
- Polymer chemistry. Volume 6:Issue 47(2015)
- Journal:
- Polymer chemistry
- Issue:
- Volume 6:Issue 47(2015)
- Issue Display:
- Volume 6, Issue 47 (2015)
- Year:
- 2015
- Volume:
- 6
- Issue:
- 47
- Issue Sort Value:
- 2015-0006-0047-0000
- Page Start:
- 8176
- Page End:
- 8183
- Publication Date:
- 2015-10-09
- Subjects:
- Polymers -- Periodicals
Macromolecules -- Periodicals
Polymerization -- Periodicals
547.705 - Journal URLs:
- http://www.rsc.org/Publishing/Journals/PY/Index.asp ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/c5py01274k ↗
- Languages:
- English
- ISSNs:
- 1759-9954
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 6547.703400
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 2343.xml