Cite
HARVARD Citation
Kim, J. et al. (2016). 3D Tailored Crumpling of Block‐Copolymer Lithography on Chemically Modified Graphene. Advanced materials. 28 (8), pp. 1591-1596. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Kim, J. et al. (2016). 3D Tailored Crumpling of Block‐Copolymer Lithography on Chemically Modified Graphene. Advanced materials. 28 (8), pp. 1591-1596. [Online].