Spectroscopy for identification of plasma sources for lithography and water window imaging. (November 2015)

• Record Type: Journal Article
• Authors: O'Sullivan, Gerry; Dunne, Padraig; Higashiguchi, Takeshi; Li, Bowen; Liu, Luning; Lokasani, Ragava; Long, Elaine; Ohashi, Hayato; O'Reilly, Fergal; Sheridan, Paul; Sokell, Emma; Suzuki, Chihiro; Wu, Tao
• Is Part Of: Journal of physics. Number 635(2015)
• Publication Date: 2015-11
• Subjects: Physics -- Congresses; 530.5
• DOI: 10.1088/1742-6596/635/1/012026
• Languages: English
• ISSNs: 1742-6588

Abstract

Abstract: The identification of sources for applications that include nanolithography, surface patterning and high resolution imaging is the focus of a considerable activity in the extreme ultraviolet (EUV) or soft x-ray (SXR) spectral regions. We report on the result of a study of the spectra from laser produced plasmas of a number of medium and high Z metals undertaken in order to identify potential sources for use with available multilayer mirrors. The main focus was the study of unresolved transition arrays emitted from ions with 3d, 4d and 4f valence subshells that emit strongly in the water window (2.34-4.38 nm).and that could be used for biological imaging or cell tomography.