Laterally Ordered Sub‐10 nm Features Obtained From Directed Self‐Assembly of Si‐Containing Block Copolymer Thin Films. Issue 48 (5th November 2015)

• Record Type: Journal Article
• Authors: Rho, Yecheol; Aissou, Karim; Mumtaz, Muhammad; Kwon, Wonsang; Pécastaings, Gilles; Mocuta, Cristian; Stanecu, Stefan; Cloutet, Eric; Brochon, Cyril; Fleury, Guillaume; Hadziioannou, Georges
• Is Part Of: Small. Volume 11:Issue 48(2015)
• Page Start: 6377
• Page End: 6383
• Publication Date: 2015-11-05
• Subjects: block copolymers -- directed self‐assembly -- lateral order -- moiré patterns -- sinusoidal templates; Nanotechnology -- Periodicals; Nanoparticles -- Periodicals; Microtechnology -- Periodicals; 620.5
• DOI: 10.1002/smll.201500439
• Languages: English
• ISSNs: 1613-6810

Abstract

Abstract : Laterally ordered sub‐10 nm features are produced from the directed self‐assembly of poly(1, 1‐dimethyl silacyclo­butane)‐ block ‐poly(methyl methacrylate) (PDMSB‐ b ‐PMMA) thin films on sinusoidal azobenzene‐containing patterns. The use of sinusoidal surface relief grating enables the formation of very large grain areas (over several µm 2 ) consisting of out‐of‐plane PMMA cylinders.