Nanoscale Structuring of Surfaces by Using Atomic Layer Deposition. Issue 50 (5th November 2015)

• Record Type: Journal Article
• Authors: Sobel, Nicolas; Hess, Christian
• Is Part Of: Angewandte Chemie international edition. Volume 54:Issue 50(2015)
• Page Start: 15014
• Page End: 15021
• Publication Date: 2015-11-05
• Subjects: atomic layer deposition -- nanoscale -- porous materials -- structuring -- surface chemistry; Chemistry -- Periodicals; 540
• DOI: 10.1002/anie.201503680
• Languages: English
• ISSNs: 1433-7851

Abstract

Abstract: Controlled structuring of surfaces is interesting for a wide variety of areas, including microelectronic device fabrication, optical devices, bio(sensing), (electro‐, photo)catalysis, batteries, solar cells, fuel cells, and sorption. A unique feature of atomic layer deposition (ALD) is the possibility to form conformal uniform coatings on arbitrarily shaped materials with controlled atomic‐scale thickness. In this Minireview, we discuss the potential of ALD for the nanoscale structuring of surfaces, highlighting its versatile application to structuring both planar substrates and powder materials. Recent progress in the application of ALD to porous substrates has even made the nanoscale structuring of high‐surface‐area materials now feasible, thereby enabling novel applications, such as those in the fields of catalysis and alternative energy. Abstract : Deposit account : Atomic layer deposition (ALD) has great potential for the nanoscale structuring of surfaces. This Minireview highlights the application of ALD to the structuring of both planar and porous materials. The nanoscale structuring of high‐surface‐area materials by ALD is now even feasible, thus enabling novel applications, such as those in the fields of catalysis and alternative energy.