Effects of Current Confinement on the Spark Plasma Sintering of Silicon Carbide Ceramics. Issue 9 (18th June 2015)

• Record Type: Journal Article
• Authors: Román‐Manso, Benito; Belmonte, Manuel; Osendi, María Isabel; Miranzo, Pilar; Derby, B.
• Is Part Of: Journal of the American Ceramic Society. Volume 98:Issue 9(2015)
• Page Start: 2745
• Page End: 2753
• Publication Date: 2015-06-18
• Subjects: Ceramics -- Periodicals; 620.1405
• DOI: 10.1111/jace.13678
• Languages: English
• ISSNs: 0002-7820

Abstract

<abstract abstract-type="main" id="jace13678-abs-0001"> <title> <x xml:space="preserve">Abstract</x> </title> <p>Despite numerous works have recently reported the densification of silicon carbide (SiC) ceramics using the Spark Plasma Sintering (SPS) technique, the effect of the localized electric current flow near the specimen over the liquid phase sintering process of SiC ceramics and on their microstructural features has not been completely addressed. In the present work, two different SPS setups affecting current flow are selected, one based on the ordinary die/punch setup configuration, and the other employing a BN electrically insulating coating on the inner wall of the die to force the electric current to locally flow through the inner graphite foil in contact with the ceramic compact. The effective electrical resistance and the energy consumed during the SPS runs for both setups, as well as the sintering behavior, microstructure, and mechanical properties of the SPSed materials are analyzed. The BN die coating considerably increases the effective resistance of the system, decreases the power consumption, and accelerates the SiC densification. Besides, ceramic specimens experience significantly higher real temperatures than the set values and, accordingly, coarser microstructures and tougher materials than those for the ordinary setting are produced. The thermoelectrical properties of SiC materials are proposed as fundamental in their SPS process, especially when electrical current is forced through the inner part of the SPS setting around the specimen.</p> </abstract>