Chemical Analysis of Plasma‐treated Organic Surfaces and Plasma Polymers by Secondary Ion Mass Spectrometry. Issue 9 (16th June 2015)

• Record Type: Journal Article
• Authors: Delcorte, Arnaud; Cristaudo, Vanina; Zarshenas, Mohammad; Merche, Delphine; Reniers, François; Bertrand, Patrick; Fouquet, Thierry; Girard‐Lauriault, Pierre‐Luc
• Is Part Of: Plasma processes and polymers. Volume 12:Issue 9(2015:Sep.)
• Page Start: 905
• Page End: 918
• Publication Date: 2015-06-16
• Subjects: Plasma polymerization -- Periodicals; Plasma-enhanced chemical vapor deposition -- Periodicals; Plasma chemistry -- Periodicals
• DOI: 10.1002/ppap.201500061
• Languages: English
• ISSNs: 1612-8850

Abstract

<abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <sec id="ppap201500061-sec-0001" sec-type="section"> <p>This feature article is focused on the application of secondary ion mass spectrometry (time‐of‐flight SIMS) to the chemical and structural study of plasma‐treated organic surfaces and plasma polymer films. After a brief historical perspective and a presentation of the recent developments of SIMS, illustrative case studies involving plasma‐treated polymer surfaces and plasma polymers are presented. Beyond surface analysis by static SIMS, we show the potential of molecular depth‐profiling by low‐energy Cs⁺ ions and large Ar_n⁺ clusters for the in‐depth chemical characterization of plasma‐modified samples. Together with SIMS data processing by multivariate analysis, molecular depth‐profiling could provide a step change for the analysis of films treated or polymerized with plasmas. <inline-graphic xlink:href="ark:/27927/pgj2ntc4zdd" content-type="ppap201500061-gra-0001" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></p> </sec> </abstract>