"Multipoint Force Feedback" Leveling of Massively Parallel Tip Arrays in Scanning Probe Lithography. Issue 35 (16th June 2015)

• Record Type: Journal Article
• Authors: Noh, Hanaul; Jung, Goo‐Eun; Kim, Sukhyun; Yun, Seong‐Hun; Jo, Ahjin; Kahng, Se‐Jong; Cho, Nam‐Joon; Cho, Sang‐Joon
• Is Part Of: Small. Volume 11:Issue 35(2015)
• Page Start: 4526
• Page End: 4531
• Publication Date: 2015-06-16
• Subjects: Nanotechnology -- Periodicals; Nanoparticles -- Periodicals; Microtechnology -- Periodicals; 620.5
• DOI: 10.1002/smll.201403736
• Languages: English
• ISSNs: 1613-6810

Abstract

<abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p>Nanoscale patterning with massively parallel 2D array tips is of significant interest in scanning probe lithography. A challenging task for tip‐based large area nanolithography is maintaining parallel tip arrays at the same contact point with a sample substrate in order to pattern a uniform array. Here, polymer pen lithography is demonstrated with a novel leveling method to account for the magnitude and direction of the total applied force of tip arrays by a multipoint force sensing structure integrated into the tip holder. This high‐precision approach results in a 0.001° slope of feature edge length variation over 1 cm wide tip arrays. The position sensitive leveling operates in a fully automated manner and is applicable to recently developed scanning probe lithography techniques of various kinds which can enable "desktop nanofabrication."</p> </abstract>