Tailored Height Gradients in Vertical Nanowire Arrays via Mechanical and Electronic Modulation of Metal‐Assisted Chemical Etching. Issue 33 (28th May 2015)
- Record Type:
- Journal Article
- Title:
- Tailored Height Gradients in Vertical Nanowire Arrays via Mechanical and Electronic Modulation of Metal‐Assisted Chemical Etching. Issue 33 (28th May 2015)
- Main Title:
- Tailored Height Gradients in Vertical Nanowire Arrays via Mechanical and Electronic Modulation of Metal‐Assisted Chemical Etching
- Authors:
- Otte, M. A.
Solis‐Tinoco, V.
Prieto, P.
Borrisé, X.
Lechuga, L. M.
González, M. U.
Sepulveda, B. - Abstract:
- <abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p>In current top‐down nanofabrication methodologies the design freedom is generally constrained to the two lateral dimensions, and is only limited by the resolution of the employed nanolithographic technique. However, nanostructure height, which relies on certain mask‐dependent material deposition or etching techniques, is usually uniform, and on‐chip variation of this parameter is difficult and generally limited to very simple patterns. Herein, a novel nanofabrication methodology is presented, which enables the generation of high aspect‐ratio nanostructure arrays with height gradients in arbitrary directions by a single and fast etching process. Based on metal‐assisted chemical etching using a catalytic gold layer perforated with nanoholes, it is demonstrated how nanostructure arrays with directional height gradients can be accurately tailored by: (i) the control of the mass transport through the nanohole array, (ii) the mechanical properties of the perforated metal layer, and (iii) the conductive coupling to the surrounding gold film to accelerate the local electrochemical etching process. The proposed technique, enabling 20‐fold on‐chip variation of nanostructure height in a spatial range of a few micrometers, offers a new tool for the creation of novel types of nano‐assemblies and metamaterials with interesting technological applications in fields such as nanophotonics,<abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p>In current top‐down nanofabrication methodologies the design freedom is generally constrained to the two lateral dimensions, and is only limited by the resolution of the employed nanolithographic technique. However, nanostructure height, which relies on certain mask‐dependent material deposition or etching techniques, is usually uniform, and on‐chip variation of this parameter is difficult and generally limited to very simple patterns. Herein, a novel nanofabrication methodology is presented, which enables the generation of high aspect‐ratio nanostructure arrays with height gradients in arbitrary directions by a single and fast etching process. Based on metal‐assisted chemical etching using a catalytic gold layer perforated with nanoholes, it is demonstrated how nanostructure arrays with directional height gradients can be accurately tailored by: (i) the control of the mass transport through the nanohole array, (ii) the mechanical properties of the perforated metal layer, and (iii) the conductive coupling to the surrounding gold film to accelerate the local electrochemical etching process. The proposed technique, enabling 20‐fold on‐chip variation of nanostructure height in a spatial range of a few micrometers, offers a new tool for the creation of novel types of nano‐assemblies and metamaterials with interesting technological applications in fields such as nanophotonics, nanophononics, microfluidics or biomechanics.</p> </abstract> … (more)
- Is Part Of:
- Small. Volume 11:Issue 33(2015)
- Journal:
- Small
- Issue:
- Volume 11:Issue 33(2015)
- Issue Display:
- Volume 11, Issue 33 (2015)
- Year:
- 2015
- Volume:
- 11
- Issue:
- 33
- Issue Sort Value:
- 2015-0011-0033-0000
- Page Start:
- 4201
- Page End:
- 4208
- Publication Date:
- 2015-05-28
- Subjects:
- Nanotechnology -- Periodicals
Nanoparticles -- Periodicals
Microtechnology -- Periodicals
620.5 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1613-6829 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/smll.201500175 ↗
- Languages:
- English
- ISSNs:
- 1613-6810
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8309.952000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 4395.xml