A study of X‐ray multiple diffraction by means of section topography. Issue 5 (21st July 2015)

• Record Type: Journal Article
• Authors: Kohn, V. G.; Smirnova, I. A.
• Is Part Of: Acta crystallographica. Volume 71:Issue 5(2015:Sep.)
• Page Start: 519
• Page End: 525
• Publication Date: 2015-07-21
• Subjects: Crystallography -- Periodicals; Condensed matter -- Periodicals; 548
• DOI: 10.1107/S2053273315012176
• Languages: English
• ISSNs: 2053-2733

Abstract

<abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p>The results of theoretical and experimental study are presented for the question of how the X‐ray multiple diffraction in a silicon single crystal influences the interference fringes of section topography for the 400 reflection in the Laue case. Two different cases of multiple diffraction are discovered for zero and very small values of the azimuthal angle for the sample in the form of a plate with the surface normal to the 001 direction. The cases are seen on the same topogram without rotation of the crystal. Accurate computer simulations of the section topogram for the case of X‐ray multiple diffraction are performed for the first time. It is shown that the structure of interference fringes on the section topogram in the region of multiple diffraction becomes more complicated. It has a very sharp dependence on the azimuthal angle. The experiment is carried out using a laboratory source under conditions of low resolution over the azimuthal angle. Nevertheless, the characteristic inclination of the interference fringes on the tails of the multiple diffraction region is easily seen. This phenomenon corresponds completely to the computer simulations.</p> </abstract>