High quality sub-10 nm graphene nanoribbons by on-chip PS-b-PDMS block copolymer lithography1. Issue 82 (5th September 2015)

• Record Type: Journal Article
• Authors: Rasappa, Sozaraj; Caridad, José M.; Schulte, Lars; Cagliani, Alberto; Borah, Dipu; Morris, Michael A.; Bøggild, Peter; Ndoni, Sokol
• Is Part Of: RSC advances. Volume 5:Issue 82(2015)
• Page Start: 66711
• Page End: 66717
• Publication Date: 2015-09-05
• Subjects: Chemistry -- Periodicals; 540.5
• DOI: 10.1039/c5ra11735f
• Languages: English
• ISSNs: 2046-2069

Abstract

<abstract abstract-type="toc"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <graphic position="anchor" id="ga" xlink:href="ark:/27927/pgj2fh0j1xk" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" />"High quality sub-10 nm graphene nanoribbons by on-chip PS-<italic>b</italic>-PDMS block copolymer lithography", SEM image of sub-10 nm graphene nanoribbons fabricated using a brushless lamellar PS-<italic>b</italic>-PDMS (5k–5.5k) block copolymer and its Raman spectra.</p> </abstract>