This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Rapid synthesis of nc-Si/a-SiNx:H QD thin films by plasma processing for their cost effective applications in photonic and photovoltaic devices. Issue 78 (26th August 2015)
Record Type:
Journal Article
Title:
Rapid synthesis of nc-Si/a-SiNx:H QD thin films by plasma processing for their cost effective applications in photonic and photovoltaic devices. Issue 78 (26th August 2015)
Main Title:
Rapid synthesis of nc-Si/a-SiNx:H QD thin films by plasma processing for their cost effective applications in photonic and photovoltaic devices
<abstract abstract-type="toc"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <graphic position="anchor" id="ga" xlink:href="ark:/27927/pgj2b39h6h0" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" />A rapid and single step synthesis of nc-Si/a-SiN<sub><italic>x</italic></sub>:H QD thin films has been made possible from a (SiH<sub>4</sub> + NH<sub>3</sub>) gas mixture, with the advent of high density low pressure planar inductively coupled plasma processing.</p> </abstract>