Cite
HARVARD Citation
Knapp, C. et al. (n.d.). Synthesis and characterisation of novel aluminium and gallium precursors for chemical vapour deposition1. New journal of chemistry. pp. 6585-6592. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Knapp, C. et al. (n.d.). Synthesis and characterisation of novel aluminium and gallium precursors for chemical vapour deposition1. New journal of chemistry. pp. 6585-6592. [Online].