Effect of Al evaporation temperature on the properties of Al films grown on sapphire substrates by molecular beam epitaxy. Issue 37 (25th April 2015)

• Record Type: Journal Article
• Authors: Wang, Wenliang; Yang, Weijia; Liu, Zuolian; Wang, Haiyan; Lin, Yunhao; Zhou, Shizhong; Lin, Zhiting; Qian, Huirong; Wen, Lei; Yang, Meijuan; Zhu, Yunnong; Liu, Guorong; Gao, Fangliang; Li, Guoqiang
• Is Part Of: RSC advances. Volume 5:Issue 37(2015)
• Page Start: 29153
• Page End: 29158
• Publication Date: 2015-04-25
• Subjects: Chemistry -- Periodicals; 540.5
• DOI: 10.1039/c5ra04088d
• Languages: English
• ISSNs: 2046-2069

Abstract

<abstract abstract-type="toc"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <graphic position="anchor" id="ga" xlink:href="ark:/27927/pgjjkssg05" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" />The effect of Al evaporation temperature on the properties of Al films grown on sapphire substrates by molecular beam epitaxy has been studied in detail.</p> </abstract>