Conformal growth of copper sulfide thin films on highly textured surface via microreactor-assisted solution deposition. Issue 14 (14th April 2015)

• Record Type: Journal Article
• Authors: Vas-Umnuay, Paravee; Kim, Ki-Joong; Kim, Dae-Hwan; Chang, Chih-Hung
• Is Part Of: CrystEngComm. Volume 17:Issue 14(2015)
• Page Start: 2827
• Page End: 2836
• Publication Date: 2015-04-14
• Subjects: Crystals -- Periodicals; Crystal growth -- Periodicals; Crystallography -- Periodicals; Cristaux -- Périodiques; Cristaux -- Croissance -- Périodiques; Cristallographie -- Périodiques; 548
• DOI: 10.1039/c4ce02374a
• Languages: English
• ISSNs: 1466-8033

Abstract

<abstract abstract-type="toc"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <graphic position="anchor" id="ga" xlink:href="ark:/27927/pgjjkpgxs2" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" />In this work, the preparation of copper sulfide (Cu_{<italic>x</italic>}S) thin films <italic>via</italic> microreactor-assisted solution deposition (MASD), consisting of separation of the homogeneous reaction and deposition from the molecular level heterogeneous surface reaction, is demonstrated.</p> </abstract>