Reducing dielectric loss in CaCu3Ti4O12 thin films by high-pressure oxygen annealing. Issue 14 (14th April 2015)

• Record Type: Journal Article
• Authors: Lin, Y.; Feng, D. Y.; Gao, M.; Ji, Y. D.; Jin, L. B.; Yao, G.; Liao, F. Y.; Zhang, Y.; Chen, C. L.
• Is Part Of: Journal of materials chemistry. Volume 3:Issue 14(2015)
• Page Start: 3438
• Page End: 3444
• Publication Date: 2015-04-14
• Subjects: Materials -- Periodicals; Chemistry, Analytic -- Periodicals; Optical materials -- Research -- Periodicals; Electronics -- Materials -- Research -- Periodicals; 543.0284
• DOI: 10.1039/c5tc00197h
• Languages: English
• ISSNs: 2050-7526

Abstract

<abstract abstract-type="toc"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <graphic position="anchor" id="ga" xlink:href="ark:/27927/pgjjgvf2rz" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" />High pressure oxygen annealing could reduce the dielectric loss in CCTO films as well as induce obvious difference in strain status.</p> </abstract>