Evolution of the microstructure in titanium dioxide films during chemical vapor deposition. Issue 7 (18th May 2015)

• Record Type: Journal Article
• Authors: Baryshnikova, Marina; Filatov, Leonid; Mishin, Maxim; Uvarov, Andrey; Kondrateva, Anastasia; Alexandrov, Sergey
• Is Part Of: Physica status solidi. Volume 212:Issue 7(2015:Jul.)
• Page Start: 1533
• Page End: 1538
• Publication Date: 2015-05-18
• Subjects: Solid state physics -- Periodicals; Solids -- Industrial applications -- Periodicals; 530.41
• DOI: 10.1002/pssa.201532300
• Languages: English
• ISSNs: 1862-6300

Abstract

<abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <sec id="pssa201532300-sec-0001" sec-type="section"> <p>Chemical vapor deposition (CVD) provides fabrication of high purity conformal layers of titanium dioxide with different structure for various applications. In this work CVD of titania layers from titanium tetraisopropoxide (TTIP) and oxygen at 1 kPa and in the substrate temperature range <italic>T</italic>_s = 300–500 °C was studied. It was found that growth of TiO₂ is a non‐stationary process. Two periods of time characterized by different deposition rates were observed. Formation of amorphous TiO₂ occurs at the initial period of the deposition process whereas polycrystalline titania with anatase crystal structure is deposited at the second period. Substrate temperature determines degree of crystallinity, texture, and microstructure of the deposited titania layers.</p> </sec> </abstract>