A practical MOCVD approach to the growth of Pr1–xCaxMnO3 films on single crystal substrates. Issue 7 (11th June 2015)

• Record Type: Journal Article
• Authors: Catalano, Maria R.; Toro, Roberta G.; Schilirò, Emanuela; Lo Nigro, Raffaella; Condorelli, Guglielmo G.; Malandrino, Graziella
• Is Part Of: Physica status solidi. Volume 212:Issue 7(2015:Jul.)
• Page Start: 1550
• Page End: 1555
• Publication Date: 2015-06-11
• Subjects: Solid state physics -- Periodicals; Solids -- Industrial applications -- Periodicals; 530.41
• DOI: 10.1002/pssa.201532363
• Languages: English
• ISSNs: 1862-6300

Abstract

<abstract abstract-type="main" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <sec id="pssa201532363-sec-0001" sec-type="section"> <p>Pr_{1–<italic>x</italic>}Ca_{<italic>x</italic>}MnO₃ thin films have been deposited through an <italic>in</italic><italic>situ</italic> metal organic chemical vapor deposition (MOCVD) process using a molten multi‐metal source, consisting of the Pr(hfa)₃·diglyme, Ca(hfa)₂·tetraglyme, and Mn(tmhd)₃ precursor mixture on single crystal substrates such as LaAlO₃ (001) and MgO (001). Optimization of processing parameters has allowed the deposition of homogeneous thin films in morphology, composition, and thickness. The effect of substrate has been assessed in relation to structure and morphology.<inline-graphic xlink:href="ark:/27927/pgj1m9pm17j" content-type="pssa201532363-gra-0001" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></p> <p>Field emission scanning electron microscope of a Pr_0.7Ca_0.3MnO₃ film deposited at 1000 °C on MgO (001).</p> </sec> </abstract>