Cite
HARVARD Citation
Lessiak, M. et al. (n.d.). Gaseous ternary chromium‐aluminium complexes as precursor for chemical vapour deposition. Physica status solidi. 12 (7), pp. 1043-1046. [Online].
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Lessiak, M. et al. (n.d.). Gaseous ternary chromium‐aluminium complexes as precursor for chemical vapour deposition. Physica status solidi. 12 (7), pp. 1043-1046. [Online].