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HARVARD Citation
Takahashi, T. et al. (n.d.). A calculation method of deposition profiles in chemical vapor deposition reactors using bio‐inspired algorithms. Physica status solidi. 12 (7), pp. 908-911. [Online].
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Takahashi, T. et al. (n.d.). A calculation method of deposition profiles in chemical vapor deposition reactors using bio‐inspired algorithms. Physica status solidi. 12 (7), pp. 908-911. [Online].