MOCVD growth of Pt films using a novel Pt(IV) compound as a precursor. Issue 7 (26th May 2015)

• Record Type: Journal Article
• Authors: Dorovskikh, Svetlana I.; Zharkova, Galina I.; Zelenina, Ludmila N.; Asanov, Igor P.; Kal'nii, Danila B.; Kokovkin, Vasily V.; Shubin, Yuri V.; Basova, Tamara V.; Morozova, Natalia B.; Hoffmann, Patrik; Knez, Mato; Vahlas, Constantin; Alexandrov, Sergei
• Is Part Of: Physica status solidi. Volume 12:Issue 7(2015:Jul.)
• Page Start: 1053
• Page End: 1059
• Publication Date: 2015-05-26
• Subjects: Solid state physics -- Congresses; Solid state physics -- Periodicals; Solid state physics; Conference proceedings; Periodicals; 530.41
• DOI: 10.1002/pssc.201510045
• Languages: English
• ISSNs: 1862-6351

Abstract

<abstract abstract-type="main" xml:lang="en"> <title>Abstract</title> <p>The Me₃Pt(acac)Py compound, trimethyl(pentane‐2, 4‐dionato)platinum(IV)pyridine, is synthesized and, for the first time, characterized by physico‐chemical methods to determine its chemical composition (elemental analysis, IR‐spectroscopy) and thermal behavior (thermogravimetric (TG), differential thermal analyses (DTA), differential scanning calorimetry (DSC), tensometric flow method). Due to its good volatility ln(<italic>p/p°</italic>) = 16.47–9699/T(K) at moderate temperatures (393–414 K) the compound is offered as a promising precursor for growth of Pt films by metal‐organic chemical vapour deposition (MOCVD). The Pt films deposited on various substrates including Si(100), Ta, Ti substrates, cathodes and anodes of the electrodes for pacemakers are investigated by X‐ray diffraction (XRD), scanning electron microscopy (SEM) and X‐ray photoelectron spectroscopy (XPS). The electrochemical characteristics of Pt films are also determined. (© 2015 WILEY‐VCH Verlag GmbH &amp; Co. KGaA, Weinheim)</p> </abstract>