Electrical characteristics of vapor deposited amorphous MoS2 two‐terminal structures and back gate thin film transistors with Al, Au, Cu and Ni‐Au contacts. Issue 7 (26th May 2015)
- Record Type:
- Journal Article
- Title:
- Electrical characteristics of vapor deposited amorphous MoS2 two‐terminal structures and back gate thin film transistors with Al, Au, Cu and Ni‐Au contacts. Issue 7 (26th May 2015)
- Main Title:
- Electrical characteristics of vapor deposited amorphous MoS2 two‐terminal structures and back gate thin film transistors with Al, Au, Cu and Ni‐Au contacts
- Authors:
- Kouvatsos, Dimitrios N.
Papadimitropoulos, George
Spiliotis, Thanassis
Vasilopoulou, Maria
Barreca, Davide
Gasparotto, Alberto
Davazoglou, Dimitris
Hoffmann, Patrik
Knez, Mato
Vahlas, Constantin
Alexandrov, Sergei - Abstract:
- <abstract abstract-type="main" xml:lang="en"> <title>Abstract</title> <p>Amorphous molybdenum sulphide (a‐MoS<sub>2</sub>) thin films were deposited at near room temperature on oxidized silicon substrates and were electrically characterized with the use of two‐terminal structures and of back‐gated thin film transistors utilizing the substrate silicon as gate. Current‐voltage characteristics were extracted for various metals used as pads, showing significant current variations attributable to different metal‐sulphide interface properties and contact resistances, while the effect of a forming gas anneal was determined. With the use of heavily doped silicon substrates and aluminum backside deposition, thin film transistor (TFT) structures with the a‐MoS<sub>2</sub> film as active layer were fabricated and characterized. Transfer characteristics showing a gate field effect, despite a leakage often present, were extracted for these devices, indicating that high mobility devices can be fabricated. SEM and EDXA measurements were also performed in an attempt to clarify issues related to material properties and fabrication procedures, so as to achieve a reliable and optimized a‐MoS<sub>2</sub> TFT fabrication process. (© 2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)</p> </abstract>
- Is Part Of:
- Physica status solidi. Volume 12:Issue 7(2015:Jul.)
- Journal:
- Physica status solidi
- Issue:
- Volume 12:Issue 7(2015:Jul.)
- Issue Display:
- Volume 12, Issue 7 (2015)
- Year:
- 2015
- Volume:
- 12
- Issue:
- 7
- Issue Sort Value:
- 2015-0012-0007-0000
- Page Start:
- 975
- Page End:
- 979
- Publication Date:
- 2015-05-26
- Subjects:
- Solid state physics -- Congresses
Solid state physics -- Periodicals
Solid state physics
Conference proceedings
Periodicals
530.41 - Journal URLs:
- http://mclink.library.mcgill.ca/sfx?url_ver=Z39.88-2004&ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&rfr_id=info:sid/sfxit.com:opac_856&url_ctx_fmt=info:ofi/fmt:kev:mtx:ctx&sfx.ignore_date_threshold=1&rft.object_id=1000000000365490&svc_val_fmt=info:ofi/fmt:kev:mtx:sch_svc& ↗
http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1610-1642a ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/pssc.201510025 ↗
- Languages:
- English
- ISSNs:
- 1862-6351
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 6475.235000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 4310.xml