High Broad‐Band Photoresponsivity of Mechanically Formed InSe–Graphene van der Waals Heterostructures. (15th May 2015)

• Record Type: Journal Article
• Authors: Mudd, Garry W.; Svatek, Simon A.; Hague, Lee; Makarovsky, Oleg; Kudrynskyi, Zakhar R.; Mellor, Christopher J.; Beton, Peter H.; Eaves, Laurence; Novoselov, Kostya S.; Kovalyuk, Zakhar D.; Vdovin, Evgeny E.; Marsden, Alex J.; Wilson, Neil R.; Patanè, Amalia
• Is Part Of: Advanced materials. Volume 27:Number 25(2015)
• Page Start: 3760
• Page End: 3766
• Publication Date: 2015-05-15
• Subjects: Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.201500889
• Languages: English
• ISSNs: 0935-9648

Abstract

<abstract abstract-type="graphical" xml:lang="en" id="adma201500889-abs-0001"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>High broad‐band photoresponsivity</bold> of mechanically formed InSe–graphene van der Waals heterostructures is achieved by exploiting the broad‐band transparency of graphene, the direct bandgap of InSe, and the favorable band line up of InSe with graphene. The photoresponsivity exceeds that for other van der Waals heterostructures and the spectral response extends from the near‐infrared to the visible spectrum. <graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgj1d0h9g9s" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></p> </abstract>