Back Cover: Plasma Process. Polym. 6∕2015. Issue 6 (18th June 2015)

• Record Type: Journal Article
• Authors: Hur, Min; Lee, Jae Ok; Kang, Woo Seok; Song, Young‐Hoon
• Is Part Of: Plasma processes and polymers. Volume 12:Issue 6(2015:Jun.)
• Page Start: 602
• Page End: 602
• Publication Date: 2015-06-18
• Subjects: Plasma polymerization -- Periodicals; Plasma-enhanced chemical vapor deposition -- Periodicals; Plasma chemistry -- Periodicals
• DOI: 10.1002/ppap.201570024
• Languages: English
• ISSNs: 1612-8850

Abstract

<abstract abstract-type="graphical"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>Back Cover:</bold> Feasibility tests of abating and stabilizing pollutants emitted during semiconductor manufacturing were performed by using a plasma reactor placed before a vacuum pump. TEMAZ was fully destroyed, and the destroyed TEMAZ was transformed into ZrO_x particles with sub 10 nm size. Detailed abatement characteristics of N₂O, CF₄, CHF₃, NF₃, C₃H₆, and TEMAZ can be found in the article by Min Hur et al. <ext-link ext-link-type="uri" xlink:href="http://doi.wiley.com/10.1002/ppap.201500046" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink">on page 583</ext-link>. <graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgj11pxf9n4" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></p> </abstract>