Electrical charge-induced selective ion permeation in HfO2/porous nickel silicide hierarchical structures1. Issue 59 (28th June 2015)
- Record Type:
- Journal Article
- Title:
- Electrical charge-induced selective ion permeation in HfO2/porous nickel silicide hierarchical structures1. Issue 59 (28th June 2015)
- Main Title:
- Electrical charge-induced selective ion permeation in HfO2/porous nickel silicide hierarchical structures1
- Authors:
- Lai, Chih-Chung
Lu, Chung-Han
Lin, Chia-Kai
Chen, Hsuan-Chu
Tseng, Fan-Gang
Chueh, Yu-Lun - Abstract:
- <abstract abstract-type="toc"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <graphic position="anchor" id="ga" xlink:href="ark:/27927/pgj105kqp6f" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" />HfO<sub>2</sub>/porous nickel silicide (NiSi) hierarchical structures fabricated by metal-assisted chemical etching (MACE) followed by a silicidation process and deposition of HfO<sub>2</sub> by atomic layer deposition (ALD) have been demonstrated.</p> </abstract>
- Is Part Of:
- RSC advances. Volume 5:Issue 59(2015)
- Journal:
- RSC advances
- Issue:
- Volume 5:Issue 59(2015)
- Issue Display:
- Volume 5, Issue 59 (2015)
- Year:
- 2015
- Volume:
- 5
- Issue:
- 59
- Issue Sort Value:
- 2015-0005-0059-0000
- Page Start:
- 47294
- Page End:
- 47299
- Publication Date:
- 2015-06-28
- Subjects:
- Chemistry -- Periodicals
540.5 - Journal URLs:
- http://pubs.rsc.org/en/Journals/JournalIssues/RA ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/c5ra03278d ↗
- Languages:
- English
- ISSNs:
- 2046-2069
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8036.750300
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 3517.xml