The influence of surface topography on the field emission of nanostructured copper oxide thin films grown by oblique incidence deposition1. Issue 24 (28th June 2015)

• Record Type: Journal Article
• Authors: Chatterjee, S.; Kumar, M.; Pal, A.; Thakur, I.; Som, T.
• Is Part Of: Journal of materials chemistry. Volume 3:Issue 24(2015)
• Page Start: 6389
• Page End: 6394
• Publication Date: 2015-06-28
• Subjects: Materials -- Periodicals; Chemistry, Analytic -- Periodicals; Optical materials -- Research -- Periodicals; Electronics -- Materials -- Research -- Periodicals; 543.0284
• DOI: 10.1039/c5tc00662g
• Languages: English
• ISSNs: 2050-7526

Abstract

<abstract abstract-type="toc"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <graphic position="anchor" id="ga" xlink:href="ark:/27927/pgj1059fqhg" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" />The surface morphology dependent field electron emission characteristic of copper oxide thin films shows superior field emission of obliquely sputter deposited thin film (turn-on field ∼1.3 V μm⁻¹) compared to normally deposited film.</p> </abstract>