Atomic layer deposition of epitaxial CeO2 thin layers for faster surface hydrogen oxidation and faster bulk ceria reduction/reoxidation. Issue 19 (21st May 2015)

• Record Type: Journal Article
• Authors: Marizy, Adrien; Roussel, Pascal; Ringuedé, Armelle; Cassir, Michel
• Is Part Of: Journal of materials chemistry. Volume 3:Issue 19(2015)
• Page Start: 10498
• Page End: 10503
• Publication Date: 2015-05-21
• Subjects: Materials -- Research -- Periodicals; Chemistry, Analytic -- Periodicals; Environmental sciences -- Research -- Periodicals; 543.0284
• DOI: 10.1039/c5ta00861a
• Languages: English
• ISSNs: 2050-7488

Abstract

<abstract abstract-type="toc"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <graphic position="anchor" id="ga" xlink:href="ark:/27927/pgjn300sc3" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" />Thin ceria layers of 120 nm were processed by atomic layer deposition on both YSZ(100) single crystal substrates and polycrystalline YSZ ones.</p> </abstract>