Defect-dependent colossal negative thermal expansion in UiO-66(Hf) metal–organic framework1. Issue 17 (7th May 2015)

• Record Type: Journal Article
• Authors: Cliffe, Matthew J.; Hill, Joshua A.; Murray, Claire A.; Coudert, François-Xavier; Goodwin, Andrew L.
• Is Part Of: Physical chemistry chemical physics. Volume 17:Issue 17(2015)
• Page Start: 11586
• Page End: 11592
• Publication Date: 2015-05-07
• Subjects: Chemistry, Physical and theoretical -- Periodicals; 541.3
• DOI: 10.1039/c5cp01307k
• Languages: English
• ISSNs: 1463-9076

Abstract

<abstract abstract-type="toc"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <graphic position="anchor" id="ga" xlink:href="ark:/27927/pgjn2c4hz0" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" />Thermally densified UiO-66(Hf) shows the strongest reported isotropic negative thermal expansion (NTE) in a metal–organic framework. Incorporation of defects allows for tuning of the magnitude of both the densification and the NTE.</p> </abstract>